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Website: http://www.briontech.com/

Brion provides innovative products and services that will fundamentally improve the manufacturing economics of the global semiconductor industry. An interrelated set of challenges in lithography - the process of transferring circuit design patterns onto silicon wafers - threatens to derail the semiconductor industry from its historical paths of technology improvement and economic growth. The...More»

Address: 4211 Burton Drive Santa Clara, CA 95054 Map it »

Phone: 408-653-1500

Email: info@briontech.com

Founded: 2002

Industry: Computer Hardware and Electronics

Sub-Industry: Semiconductors

Legal Structure: Corporation

Ownership: Private

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Board of Directors

Date	Type	Capital Amount	Post-Money Valuation	Investors
05/01/2004	Series B	19M	Unknown	Jafco Ventures, JPMorgan Partners, Mohr, Davidow Ventures, Morgenthaler Ventures, Panorama Capital, Silver Lake Partners, U.S. Venture Partners, Western Technology Investments, WK Associates, Stanford University

Name:	LithoCruiser
Product URL:	http://www.briontech.com/LithoCruiser_summary.asp
Description:	LithoCruiser is the industry's only integrated software suite for low-k1 lithography optimization. LithoCruiser analyzes and optimizes the most advanced scanner performance (including hyper-NA, immersion and polarization) and mask design simultaneously. It can be easily used to develop new lithography processes and optimize existing processes at the design, photomask and imaging levels. LithoCruiser is tightly integrated with ASML's leading-edge scanners, enabling relevant information such as actual illumination profiles and volume manufacturing effects to be used in the analysis and optimization of wafer imaging performance. LithoCruiser is targeted for use by lithography technology development organizations of semiconductor manufacturers. Complete Low-k1 Solution Path LithoCruiser enables users to develop, characterize and optimize the entire pre-production process, from mask design to wafer imaging-without producing a single mask or exposing a single wafer. Scanner and Mask Optimization Several powerful functions are offered for automatic optimization of NA/sigma, illumination shape and OPC. Optimization is performed by taking into account proprietary ASML scanner specifications, thus producing manufacturable results. Additionally, multiple simulations and optimizations can be set up and sequenced for more in-depth metric-based analysis and scanner comparisons. ASML Scanner Database LithoCruiser's database includes specific available illumination conditions for ASML's advanced scanner platforms, as well as Jones Pupil, DOE data files, and lens models to reflect varying manufacturing conditions. Highly Accurate and Tunable Resist Models LithoCruiser includes the most advanced 3D lumped parameter model(LPM) and ¡°full physical¡± resist models, which can be calibrated through focus and exposure, providing highly accurate process analyses and optimized settings. Ease of Use The state-of-the-art graphical user-interface (GUI) allows intuitive entry of process parameters and provides easy access to lithography process actions. Open Access Platform A powerful Applications Programming Interface (API) enables users to build their own customized set of analysis and optimization applications.
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