Rogue Valley Microdevices

Founded in 2003, Rogue Valley Microdevices has become a leader in delivering high quality thin film products and services to the Semiconductor, MEMS, and Solar community. Rogue Valley Microdevices maintains a facility that is capable of handling high volume manufacturing but flexible enough to process wafers from 25mm to 300mm in diameter.

Rogue Valley Microdevices offers a variety of processes, including Low Stress LPCVD Nitride, PECVD Oxide, PECVD Nitride, PECVD Silicon Carbide, Thermal Oxidation, Chlorinated Oxidation, N2/H2 Annealing, and a variety of PVD films to satisfy their customers needs.